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The SkiM system comprises several components (see Figure 12.3). The ontology editor OntoEdit allows an administrator to create and edit the required ontologies for skills, education and job functions. OntoEdit enables inspecting, browsing, codifying and modifying ontologies and therefore supports the ontology development and maintenance tasks. The ontologies are modelled at a conceptual level and independently of the formalism of the nal representation language. OntoEdit offers views on conceptual structures, such as concepts, concept hierarchy, relations, or axioms (see 7). For the early phases of ontology development, the MindManager tool was used to edit the ontologies because it better supports brainstorming processes. The web application part of SkiM allows employees to build their personalized intranet home pages by lling in the information categories given by templates. Sesame is an RDF/RDF Schema storage and retrieval system. Within SkiM Sesame stores the skills ontology as an RDF Schema and the

A CPU fork (you can use a small slot screwdriver, but it s not nearly as safe) A deck of playing cards A short length of 2 2 wood Stabilant-22 (recommended, but not strictly necessary)

Just like the Writer package, the Calc package allows you to read and write various spreadsheet formats:

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The factor n - 1 (instead of n) was substituted to preserve equivalence with the classical formula for the estimated standard deviation of the sample mean Almost equivalently, we can use the jackknife method (Section 15) In some cases, both (683) and the jackknife fail, for instance for the sample median In this particular case, we can take recourse to the well-known nonparametric confidence intervals for the median, given by the interval between two selected order statistics ( x c ( ~ () ,, + ~ - i ) If we then divide x ( , + ~ - ~ ) cc(i) by a suitable constant ~ ) 2c, we may also get an estimate D, satisfying (680) In view of the central limit theorem, the proper choice is, asymptotically, (684) where a is the level of the confidence interval.

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BOMs are made in one of two ways. The default BOM is made from a special SolidWorks table, while an Excel-based BOM is driven by Excel. While Excel has advantages and disadvantages, many users appear to prefer the default BOM. The reason is that little is perceived to be given up, except for the stability (crash-worthiness) compared to Excel and the options to keep manual edits. If you plan to use anything other than the standard SolidWorks BOM templates, then you need to make your own BOM templates. If you plan to create either Excel or SolidWorks table-based templates, then you must choose one of them.

Figure 10.4 Using the allowable VUD, the projected inverter delay (1/FOM) versus to,, plots: (a) for various interconnect capacitances; (b) for various fanouts. (After Rodder et al., Ref. 2.) Although the determination of tox is becoming straightforward and defined in the SIA Roadmap, the validity of the to, so determined is not as simple and worth mentioning.2,7 Figure 10.4a, b show the inverter delays as a function of t.x with varying interconnect capacitance (Cinterconnect) and varying fanout (FO = 1-5), respectively. For driving a long metal line with large Cinterconnect, the higher the Idive, the better. Thus, the minimum delay always occurs at around t,, = 6-7 nm, where the allowable VDD and drive are the highest. On the other hand, for driving logic gates with various fanouts (FOs), minimum delay occurs at to,, = 6-7 nm for smaller FO (= 1-3); while for larger FO (of > 5) the minimum delay becomes relatively insensitive to tox and gradually shifts toward thicker tox (8-9 nm). This is because for large FO, loading capacitance is dominated by gate capacitance which increases linearly with 1/to,. However, ldfve does not increase linearly with 1/tox, even at a fixed VG - VT, due to the higher vertical effective electrical field and thus lower surface mobility, which in turn increases the , (see Eq. 10.10) and thus lowers the Idriw (Eq. 10.8). Therefore, under high fanout situations, the optimum tox tends to be a little

(Bottom metal extended to the lateral side)

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