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gate has the same physics as the dual-gate SOI transistor, but it is not an SOI device One of the first publication on the dual-gate transistor concept dates back to 198459 It shows that one can obtain significant reduction of short-channel effects in a device, called XMOS, in which an excellent control of the potential in the silicon film is achieved by using a top-and-bottom gate The name of the device comes from its resemblance with the Greek letter -EUsing this configuration, better control of the channel depletion region is obtained than in a "regular" SO1 MOSFET, and, in particular, the influence of the source and drain depletion regions are kept minimal This reduces the short-channel effects by screening the source and drain field lines away from the channel More complete modeling, including Monte Carlo simulations, is presented in Ref.



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60, in which the ultimate scaling of silicon MOSFETs is explored According to that paper, the ultimate silicon device is a dualgate SO1 MOSFET with a gate length o f 30 nm, an oxide thickness of 3 nm, and a silicon film thickness of 5-20 nm Such a (simulated) device shows no short-channel effects for gate lengths larger than 70 nn, and provides transconductance values of up to 2300 mS/mm One problem with such thin devices is the splitting of the conduction band into subbands The energy minimum of the first subband controls the threshold voltage and is dependent on the silicon film thickness, according to the equation: 2 cyvT = (h2 1T/qm*t i)asi, where CaVT is the threshold uncertainty and Usi, is the silicon film thickness uncertainty The latter result is similar to the quantum61 mechanical increase of threshold voltage in ultrathin SO devices.

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Is should not be a surprise that BeCu (beryllium copper) has the highest conductivity For low-frequency (<10 100 kHz) magnetic field shielding, the permeability must be much greater than 1 for optimal performance This is why most gaskets, regardless of their composition or type, normally do not provide effective low-frequency magnetic field shielding High-permeability materials must be used, which are very expensive Corrosion is also a concern because it leads to reduced shielding effectiveness as it causes the gasket material to become nonconductive The major contributors to this problem are surface contact area, material dissimilarity, and the presence of an electrolyte Galvanic compatible materials are those that are within 025 V of each other For commercial applications where the environment is controlled, the range can be increased up to 05 06 V If large contact voltages are present, the more anodic material will eventually be destroyed.

Fully depleted SOI MOSFETs are kncwn to have a near-ideal subthreshold slope For a slope factor of 105, a subthreshold slope of 63 mV/decade is indeed expected, but the presence of interface states brings it up to values around 66-68 mV/decade In dual-gate SOI MOSFETs, values vety close to the theoretical limit of 60 mV/ decade are expected Furthermore, this low value can be obtained for very short channel lengths provided the gate oxide thickness and the silicon film thickness are scaled accordingly Theoretical investigation shows a subthreshold slope with values lower than 63 mV/decade can be obtained for a gate length down to 01 gm if the device is designed using a scaling parameter v = L/2k, where L is the gate length, and X, called the "natural length," is equal to k sit~ito 1 4(oxtsi 520).

INSTRUMENTATION of small size X-ray tubes. They have the advantage of having very small sizes (Figure 5.3.2) and of being intrinsically stable but the disadvantage of emitting radiation of xed energy and low intensity (orders of magnitude lower than for X-ray tubes). Radioactive sources are, therefore, not exible versus energy and not suitable for analysis of low amounts of chemical elements. X and radioactive sources generally employed for EDXRF analysis are shown in Table 5.3.1.23 24 As observed above, in special cases radioactive sources are employed or mixed -X radioactive sources, where the analysis of very low Z elements is required. X-Ray Tubes The general requirements for a X-ray tube suitable for portable EDXRF equipment are the following:

Custom property data entry happens at the part or assembly level. This information is then reused in the drawing format and in tables such as BOMs and revision tables, as well as searches using the FeatureManager filter and all PDM (Product Data Management) systems make use of SolidWorks custom properties. You can enter the data several ways, but the two most prominent ways are through the Summary Information dialog and through the Custom Properties Tab in the Task Pane.

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