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known by their primary purpose; gearing up or down, or simply coupling. The mechanisms known as transmissions tend to provide a more intricate set of behaviors. Look at the wheeled base in Fig. 9-25, for example, with its big wheels. Ignore for a minute how it is powered or how it might be steered. For now, you can grab it by hand and drive it around manually ( vroom noises are optional). If it is driving in a straight line, both of the wheels turn at the same speed. If it is driving in a circle, the outside wheel moves faster than the inside wheel since it has to drive a longer distance. If you connect the left and right wheels by a single axle, you could drive this base in a straight line, but if you tried to turn a corner the outside wheel would skid. How do you apply power to the two wheels and still be able to drive in a circle With a di erential. A di erential is a system of gears that applies power to two output shafts, such as our wheels, while at the same time allowing those shafts (wheels) to turn at di erent rates. Figure 9-26 shows a di erential on this base. Note how part of it looks like the wrist gearing from Fig. 8-8. The frame of the di erential is driven by the input gear. If both wheels are carrying load and providing resistance, it drives them both equally. If one wheel is not moving, the other wheel moves twice as fast. There is always the



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Modern machining processes are also used in the fabrication of MEMS and microsystems However, most of the processes are not stand-alone systems Developments are now taking place to produce MEMS devices using electrodischarge machining and laser machining For instance, Matsushita has developed a new electrodischarge machine with the capability of making very small,

precise parts out of almost any material that conducts electricity This machine uses standard machine shop tooling, and is compatible with machine shop production techniques [17]

Fig. 9-25.

.

Wheeled base (turning).





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Most of the early silicon products were fabricated using bulk micromachining where chemical etchants were used to attack different planes of a silicon crystal at different rates This approach is based on etching down into a surface, stopping on certain crystal faces, doped regions and etchable films to form the desired structure [16] This method is normally used in the production of microsensors and accelerometers The etching process, either the orientation-independent isotropic etching or the orientation-dependent anisotropic etching is well suited for substrate materials such as silicon, SiC, GaAs and quartz Wet isotropic etchants, plasma etchants and thermal oxidation methods are used to provide geometries that are independent of crystallographic orientations [9] However, isotropic etching or orientation-independent etching is less desirable because of the lack of control over the finished geometry of the workpiece [6] As most substrate materials are not isotropic in their crystalline structure, the etching process is usually orientation dependent The <110> orientation is often favoured because the wafer cleaves more cleanly Thermal oxidation is very common in the fabrication of microelectronics and microsystems There are four types of thin films that are frequently used in microelectronics and microsystems, namely, thermal oxidation for electrical or thermal insulation media, dielectric layers for electrical insulation, polycrystalline silicon for local electrical conduction and metal films for electrical (ohmic) contact and junctions [18] Silicon dioxide is used as an electric insulator as well as for etching masks for silicon and sacrificial layers in surface micromachining The silicon oxide layer is produced in an electric resistance furnace Etching is a process of the selective removal of materials by chemical means Wet etching which involves immersing the wafers in an acidic liquid solution is easy and inexpensive to perform However, it often produces poor quality surfaces due to the presence of bubbles and the flow patterns of the solution On the other hand, dry etching involves the removal of the substrate by gaseous etchants without wet chemicals Some dry etching techniques include plasma, ion milling and reactive ion etch Reactive plasma etching involves chlorine or fluorine ions that diffuse and chemically react with the substrate, forming a volatile compound that is removed by a vacuum system Figure 832 shows the illustration of reactive plasma etching and the product of deep reactive ion etching Deep reactive ion etching involves the use of a high-density plasma source which is capable of producing virtually vertical walls [6] Photolithography involves the use of an optical image and a photosensitive film to produce a pattern on a substrate It is used to set patterns for masks for cavity etching in bulk micromanufacturing or for thin-film deposition and etching of sacrificial layers in surface micromachining as well as for the primary circuitry of electrical signal transduction in sensors and actuators [6] The process of photolithography is clearly illustrated in Figure 833 The substrate is first coated with a layer of a photoresist It is then exposed to a set of lights through a transparent quartz mask.

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Microelectro-mechanical Systems (MEMS)

Fig. 9-26.

Fig 832: An illustration of reactive plasma etching and an example of a deep-reactive etched trench [16]

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